Intel (INTC, Financial) announced that the first two advanced lithography machines from ASML have been put into production at its facility. Initial data indicates these new machines are more reliable than previous models. Senior Principal Engineer Steve Carson shared that Intel used ASML's high numerical aperture (NA) lithography machines to produce 30,000 wafers in a quarter, each capable of generating thousands of computing chips.
Last year, Intel became the first chip manufacturer globally to receive these machines, which are expected to produce smaller and faster computing chips compared to ASML's older models. This move signifies a strategic shift for Intel, which had lagged behind competitors in adopting the previous generation of extreme ultraviolet (EUV) lithography machines.
Carson noted that initial tests show the reliability of ASML's high NA lithography machines is approximately double that of the previous generation. He emphasized the consistent wafer production as a significant advantage for the platform. Early results from Intel's factory reveal that the high NA machines can complete tasks with a single exposure and minimal processing steps, compared to the three exposures and approximately 40 steps required by older machines.
Intel plans to use these high NA lithography machines to develop its 18A manufacturing technology, slated for mass production later this year alongside new-generation PC chips. The company also aims to fully deploy these machines with its next-gen 14A manufacturing technology, although a production date has not been disclosed.
