Jan 26 - Intel (INTC, Financial) announced that its new ASML (ASML, Financial) high NA lithography machines are now fully operational, marking a major production milestone. Senior principal engineer Steven Carson explained that the advanced 18A technology is actively supporting tool testing at the San Jose facility. Over the past quarter, the company maintained a steady production pace, manufacturing 30,000 wafers, key components in chip fabrication.
During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the performance of earlier EUV systems, yet they deliver significantly improved reliability. These advanced tools streamline the process: what once required three exposures and roughly 40 processing steps now takes just one exposure with a few additional refinements, yielding substantial efficiency gains and cost savings.
Last year, Intel acquired next-generation ASML equipment and received its first deliveries from the manufacturer. Meanwhile, earlier EUV delays allowed competitors such as TSMC to capture market share.
Looking ahead, Intel plans to deploy these machines within its 14A technology platform, scheduled for release this year. This new system will underpin future PC and server chips, promising enhanced performance.
