- DuPont's embedded barrier layer technology earns 13 scientists the 2025 Heroes of Chemistry award from the American Chemical Society.
- This innovation in 193 nm immersion lithography improves chip fabrication with increased yield, reduced defects, and enhanced efficiency.
- The technology supports advancements in artificial intelligence, advanced computing, and consumer electronics industries globally.
DuPont (DD, Financial) has announced that 13 of its current and former scientists and engineers have been recognized as 2025 Heroes of Chemistry by the American Chemical Society. The award celebrates the development of embedded barrier layer technology, a major breakthrough in semiconductor lithography. This innovative approach in 193 nm immersion lithography has vastly improved chip manufacturing by increasing yield, decreasing defects, and boosting process efficiency.
The breakthrough innovation has been widely adopted across the global semiconductor industry, supporting significant advancements in AI, advanced computing, and consumer electronics. Notably, the embedded barrier layer technology addresses critical challenges in early immersion lithography, such as defectivity and process stability, by integrating barrier functionality directly into the photoresist. This allows fabricators to simplify processes, reduce materials usage, and lower energy consumption, thereby enhancing both operational efficiency and sustainability in high-volume chip production.
Randal King, Vice President of R&D/Technology at Qnityâ„¢, DuPont Electronics, commented on the impact of this innovation, stating, "Embedded barrier layer solutions were first implemented over a decade ago and continue to be widely used today. The success of this team demonstrates how materials innovation is powering amazing leaps in technology."
The 2025 awardees will be formally honored in August during the ACS Fall 2025 meeting in Washington, D.C. More information about DuPont and its innovative solutions can be found at www.dupont.com.
