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Mecaro Co (XKRX:241770) Float Percentage Of Total Shares Outstanding : 0.00% (As of May. 10, 2025)


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What is Mecaro Co Float Percentage Of Total Shares Outstanding?

Float percentage of total shares outstanding is the percentage of float shares relative to the total shares outstanding. As of today, Mecaro Co's float shares is 0.00 Mil. Mecaro Co's total shares outstanding is 9.85 Mil. Mecaro Co's float percentage of total shares outstanding is 0.00%.

Insider Ownership is the percentage of shares that are owned by company insiders relative to the total shares outstanding. As of today, Mecaro Co's Insider Ownership is 0.00%.

Institutional Ownership is the percentage of shares that are owned by institutions out of the total shares outstanding. As of today, Mecaro Co's Institutional Ownership is 0.05%.


Mecaro Co Float Percentage Of Total Shares Outstanding Calculation

It is the percentage of float shares out of the total shares outstanding.

Mecaro Co's Float Percentage of Total Shares Outstanding for today is calculated as follows:

Float Percentage of Total Shares Outstanding=Float Shares/Total Shares Outstanding
=0.00/9.85
=0.00%

* For Operating Data section: All numbers are indicated by the unit behind each term and all currency related amount are in USD.
* For other sections: All numbers are in millions except for per share data, ratio, and percentage. All currency related amount are indicated in the company's associated stock exchange currency.


Mecaro Co Business Description

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GURUFOCUS.COM » STOCK LIST » Technology » Semiconductors » Mecaro Co Ltd (XKRX:241770) » Definitions » Float Percentage Of Total Shares Outstanding
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Address
103-14 Sandan-ro, Kyunggi-Do, Pyeogtaek, KOR, 17745
Mecaro Co Ltd is a South Korea-based semiconductor company. It is engaged in developing and researching semiconductor parts and materials. The company has two business division Chemical business division and System business division. The products of the company include semiconductor process heater block, LCD Susceptor, Ground strap used for MOCVD, ALD process thin film deposition Chemical Precursors.

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